When it comes to balancing cost, speed, and accuracy in semiconductor wet chemical control throughout the fab distribution chain, in-situ refractive index measurement has become the industry standard. It is an essential tool for concentration monitoring at incoming chemical check, wafer cleaning, chemical etching and chemical mechanical planarization (CMP).
Meet our Technical Sales Engineer, Anupama Bhandari, and learn how you can achieve better precision and consistency in your critical wafer handling operations, including:
• Chemical blend checksum of SC-1, SC-2
• Hard mask etching with NH₃ water mixes
• Silicon wet etch with 50% KOH
• Titanium etch with H₂SO₄:HNO₃:H₃PO₄ mixes
• Back-side poly etch with HF:HNO₃ mixes
• Post-CMP cleans with complex chemical blends
We’re thrilled to meet you in Munich!
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Semicon Europa 2025
13.11.2025 hrs 13:58
KxS Technologies will be joining forces with the SPS-International team at Booth B1111 during SEMICON Europa 2025 in Munich!
Pulp&Beyond 2026
Pulp&Beyond is the leading forum bringing together the latest forest-based bioeconomy innovations, products, services and technologies as the well as key people throughout the ecosystem.
10.03.2026 hrs 12:44
Dairy Innovation Strategies 2026
Together with Lund University we will present the latest membrane filtration related findings at the Dairy Innovation Strategies conference in the Netherlands.
Currently the research is centered around detection and quantification of organic fouling on polymeric membranes from dairy processing.
The overall aim for the research is to increase the sustainability of membrane processes by optimizing costs and reduce environmental impact of membrane cleaning in the dairy sector. The research is heavily dependent on pilot scale trials and input from the project’s industrial partners.
10.03.2026 hrs 12:30
BioProcess International Europe 2026
KxS Technologies will be exhibiting inline refractometer for realtime monitoring of refractive index and control of protein concentration during downstream purification (e.g., Ultra filtration UF, Diafiltration DF, tangential flow filtration TFF).
02.02.2026 hrs 13:58